专利内容由知识产权出版社提供
专利名称：CLEANING COMPOSITION AND METHOD
FOR SEMICONDUCTOR DEVICEFABRICATION
发明人：Chen-Yu Liu,Ching-Yu Chang申请号：US144983申请日：20140926
公开号：US20160090565A1公开日：20160331
专利附图：
摘要：Provided is a cleaning composition and its applications. The cleaningcomposition comprises a mixture of a halogen-containing compound and an organic
solvent. In some embodiments, the halogen-containing compound is
TetraButylAmmonium Fluoride (TBAF) and the organic solvent is either propylene glycolmonomethylether acetate (PGMEA) or a mixture of PGMEA and propylene glycolmonomethylether (PGME). The cleaning composition is effective in removing silicon-containing material off of a surface of an apparatus. In some embodiments, the apparatuscomprises a pipeline for delivering the silicon-containing material in semiconductor spin-coating processes. In some embodiments, the apparatus comprises a drain for collectingwaste fluid in semiconductor spin-coating processes. In some embodiments, theapparatus comprises a patterned substrate.
申请人：TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
地址：Hsin-Chu TW
国籍：TW
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