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专利名称：ROBUST OPTIMIZATION TO GENERATE
DROP PATTERNS IN IMPRINT
LITHOGRAPHY WHICH ARE TOLERANT OFVARIATIONS IN DROP VOLUME AND DROPPLACEMENT
发明人：Philip D. Schumaker申请号：US12579553申请日：20091015
公开号：US20100097590A1公开日：20100422
专利附图：
摘要：Imprint lithography may comprise generating a fluid map, generating a fluiddrop pattern, and applying a fluid to a substrate according to the fluid drop pattern. Thefluid drop pattern may be generated using a stochastic process such as a Monte Carlo orstructured experiment over the expected range of process variability for drop locationsand drop volumes. Thus, variability in drop placement, volume, or both may becompensated for, resulting in surface features being substantially filled with the fluidduring imprint.
申请人：Philip D. Schumaker
地址：Austin TX US
国籍：US
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