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专利名称：Diamond films
发明人：Savkar, Sudhir Dattatraya,Banhclzer, William
Frank
申请号：EP92311296.5申请日：19921210公开号：EP0556517A1公开日：19930825
专利附图：
摘要：This invention relates to an apparatus and method for making large areadiamond films using a high temperature plasma reactor (4) with a plasma reactor streamflow controller (18) constructed of a non-carbonaceous refractory metal such as
tungsten or rhenium where hydrocarbon injection is used. Such structures of this typegenerally allow large area diamond films to be created on a substrate in an efficient,cost-effective manner.
申请人：GENERAL ELECTRIC COMPANY
地址：1 River Road Schenectady, NY 12345 US
国籍：US
代理机构：Pratt, Richard Wilson
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