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专利名称：ORGANIC FILM COMPOSITION, METHOD
FOR FORMING ORGANIC FILM ANDPATTERNING PROCESS USING THIS, ANDHEAT-DECOMPOSABLE POLYMER
发明人：Takeru WATANABE,Seiichiro
TACHIBANA,Toshihiko FUJII,KazumiNODA,Toshiharu YANO,Takeshi KINSHO
申请号：US13873685申请日：20130430
公开号：US20130302990A1公开日：20131114
专利附图：
摘要：The invention provides an organic film composition comprises (A) a heat-decomposable polymer, (B) an organic solvent, and (C) an aromatic ring containing resin,with the weight reduction rate of (A) the heat-decomposable polymer from 30° C. to 250°C. being 40% or more by mass. There can be provided an organic film composition havingnot only a high dry etching resistance but also an excellent filling-up or flatteningcharacteristics.
申请人：SHIN-ETSU CHEMICAL CO., LTD.
地址：Tokyo JP
国籍：JP
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