专利内容由知识产权出版社提供
专利名称：Charged particle beam writing apparatus
and charged particle beam writing method
发明人：Yasuo Kato,Jun Yashima申请号：US137665申请日：20121009公开号：US08552405B2公开日：20131008
专利附图：
摘要：A charged particle beam writing apparatus includes a unit to calculate agradient of a convolution amount that is calculated from a convolution operationbetween an area density and a distribution function, a unit to calculate a small influence
radius phenomenon dose correction coefficient that corrects for dimension variation dueto a phenomenon whose influence radius is on an order of microns or less, by using theconvolution amount and the gradient, a unit to calculate a proximity effect dosecorrection coefficient that corrects for dimension variation due to a proximity effect, byusing a first function depending on the small influence radius phenomenon dosecorrection coefficient, a unit to calculate a dose by using the proximity effect dosecorrection coefficient and the small influence radius phenomenon dose correctioncoefficient, and a unit to write a figure pattern concerned on a target object, based onthe dose.
申请人：NuFlare Technology, Inc.
地址：Numazu PA US
国籍：US
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
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